@article {2405,
	title = {Gratings for multiresolution edge illumination X-ray phase contrast imaging: concept and simulation},
	journal = {Optics Express},
	volume = {33},
	year = {2025},
	pages = {17886-17902},
	doi = {10.1364/OE.550252},
	author = {Pieter-Jan Vanthienen and Nicholas Francken and Jonathan Sanctorum and Jan Sijbers and Jan De Beenhouwer}
}
@mastersthesis {2414,
	title = {Towards adaptive multi-resolution edge illumination X-ray phase contrast imaging},
	volume = {PhD in Sciences: Physics},
	year = {2025},
	type = {PhD thesis},
	author = {Pieter-Jan Vanthienen}
}
@article {2348,
	title = {Inline edge illumination X-ray phase contrast imaging through mask misalignment},
	journal = {Optics Express},
	volume = {32},
	year = {2024},
	pages = {32048-32061},
	doi = {10.1364/OE.525730},
	author = {Nicholas Francken and Jonathan Sanctorum and Joaquim Sanctorum and Pieter-Jan Vanthienen and Jan Sijbers and Jan De Beenhouwer}
}
@article {2467,
	title = {Mask assembly for edge illumination phase contrast radiation imaging},
	number = {EP2025062978W},
	year = {2024},
	month = {11/2025},
	edition = {G01N23/041 },
	chapter = {WO2025237942A1},
	abstract = {In general, the technology disclosed herein relates object inspection utilizing radiation imaging, more specifically, edge illumination phase contrast X-ray imaging. The apparatus and methods described in the present disclosure can be applied for inspection of various objects in different industrial settings, such as manufacturing, food, agriculture, aerospace, automotive, electronics, healthcare, transport, logistics, security, and others. An aspect of the present invention relates to a mask assembly for radiation phase contrast imaging apparatus, comprising a first mask comprising a plurality of X-ray absorbing element and apertures arranged in a manner that gradually diverges from one portion to an opposite portion of the body, resulting in a variable pitch perpendicular to the optical axis direction; and a mask alignment mechanism configured to adjust a position and/or orientation of the first mask to align the variable pitch of the first mask for phase contrast imaging.},
	author = {Jan De Beenhouwer and Jan Sijbers and Pieter-Jan Vanthienen}
}
@inproceedings {2378,
	title = {Multi-resolution gratings for edge illumination x-ray phase contrast imaging: a simulation study},
	booktitle = {Developments in X-Ray Tomography XV},
	volume = {13152},
	year = {2024},
	pages = {1315208},
	publisher = {International Society for Optics and Photonics},
	organization = {International Society for Optics and Photonics},
	keywords = {cone-beam, edge illumination, grating design, magnification, mask, monte-carlo, multi-resolution, Phase contrast},
	doi = {10.1117/12.3025968},
	url = {https://doi.org/10.1117/12.3025968},
	author = {Pieter-Jan Vanthienen and Nicholas Francken and Jan Sijbers and Jan De Beenhouwer}
}
@conference {2466,
	title = {A simulation study of optimized-aperture gratings for edge illumination cone-beam phase contrast x-ray imaging},
	year = {2024},
	month = {04/2024},
	address = {Shenzhen, China},
	abstract = {Edge illumination (EI) is an established x-ray phase-contrast imaging method that relies on gratings to obtain attenuation, phase and dark field contrast. Despite the successful transition from synchrotron to lab sources, the cone-beam geometry of lab systems limits the effectiveness of conventional gratings. The non-parallel incidence of X-rays on planar gratings with equally sized apertures introduces unwanted shadowing effects. In this paper, a grating design with optimized position-dependent apertures is introduced and compared to a conventional grating and a grating with fan-beam shaped gratings bars. Numerical simulations show that this optimized-aperture design must be considered when constructing an EI setup.},
	author = {Pieter-Jan Vanthienen and Jan Sijbers and Jan De Beenhouwer}
}
@inproceedings {2295,
	title = {Adapting an XCT-scanner to enable edge illumination X-ray phase contrast imaging},
	booktitle = {e-Journal of Nondestructive Testing},
	volume = {28},
	year = {2023},
	issn = {1435-4934},
	doi = {doi.org/10.58286/27755},
	author = {Ben Huyge and Pieter-Jan Vanthienen and Nathana{\"e}l Six and Jan Sijbers and Jan De Beenhouwer}
}
@article {2301,
	title = {Grating designs for cone beam edge illumination X-ray phase contrast imaging: a simulation study},
	journal = {Optics Express},
	volume = {31},
	year = {2023},
	pages = {28051-28064},
	abstract = {Edge illumination is an emerging X-ray phase contrast imaging technique providing attenuation, phase and dark field contrast. Despite the successful transition from synchrotron to lab sources, the cone beam geometry of lab systems limits the effectiveness of using conventional planar gratings. The non-parallel incidence of X-rays introduces shadowing effects, worsening with increasing cone angle. To overcome this limitation, several alternative grating designs can be considered. In this paper, the effectiveness of three alternative designs is compared to conventional gratings using numerical simulations. Improvements in flux and contrast are discussed, taking into account practical considerations concerning the implementation of the designs.},
	doi = {10.1364/OE.495789},
	url = {https://opg.optica.org/oe/fulltext.cfm?uri=oe-31-17-28051\&id=536127},
	author = {Pieter-Jan Vanthienen and Jonathan Sanctorum and Ben Huyge and Nathana{\"e}l Six and Jan Sijbers and Jan De Beenhouwer}
}
@inproceedings {2262,
	title = {Alternative grating designs for cone-beam edge illumination X-ray phase contrast imaging},
	booktitle = { Proc. SPIE 12242, Developments in X-Ray Tomography XIV},
	volume = {12242},
	year = {2022},
	month = {10/2022},
	pages = {122420Z},
	publisher = {SPIE},
	organization = {SPIE},
	address = {San Diego, USA},
	doi = {10.1117/12.2632301},
	author = {Pieter-Jan Vanthienen and Jonathan Sanctorum and Ben Huyge and Nathana{\"e}l Six and Jan Sijbers and Jan De Beenhouwer}
}
